EUV Lithography Process Development Engineer- TPG

Our vision is to transform how the world uses information to enrich life for all .

Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.

Welcome to Micron! Our TD photo team in Boise develops new patterning solutions for future memory nodes. We have a diverse team of engineers who work together to develop new parts and transfer them to our manufacturing sites around the world.

As a Lithography pathfinding process development engineer at Micron Technology in Boise, Idaho, you will evaluate advanced lithography including Extreme Ultra Violet (EUV) and High Numerical Aperture (High NA) EUV on next-generation memory parts. You will collaborate with our team to understand roadmap requirements for next-generation memory, and how new technologies intercept our roadmap. You will partner with technology development and manufacturing to ensure they will be ready to implement EUV and other new patterning approaches. This role may require travel to support high NA EUV work.

Responsibilities:

• Lead and participate in pathfinding activities for new patterning technology. This will include all lithography nodes, including 193nm immersion, EUV, and high NA EUV.

• Develop EUV modules in our technology development (TD) site. This includes setting up lithography processes and working with other process areas and process integration to meet manufacturing requirements.

• Travel up to once a month to the Netherlands or other locations to support early learning for high NA EUV.

• Work closely with defect inspection teams and our mask shop to develop appropriate inspection strategies for EUV masks.

• Collaborate with manufacturing sites to align on equipment and materials requirements, and to make sure EUV processes are aligned for transfer.

Qualifications & Skills:

• Understanding of EUV lithography, including differences between EUV lithography and deep ultraviolet (DUV) lithography.

• Knowledge and an understanding of 193nm immersion multiple patterning processes, including litho-etch-litho-etch (LELE) and self-aligned quadruple patterning (SAQP).

• Knowledge of optics for photolithography or experience with photolithography simulation software such as Prolith or S-Litho is helpful.

Education and Experience:

• Degree/Major: M.S. or Ph.D. in Engineering, Chemistry, Physics, or study relevant to Photolithography; or a B.S. in Engineering, Chemistry, or Physics with 5 years' semiconductor process related experience with emphasis on Photolithography will be considered.

• Coursework or proven experience showing strong statistical analysis skills, including design of experiments and data analysis. Experience with JMP, Python, or other statistical analysis software is helpful

• Strong written and verbal communication skills. Ability to write and present clear and concise executive summaries for Micron and supplier management teams.

As a world leader in the semiconductor industry, Micron is dedicated to your personal wellbeing and professional growth. Micron benefits are designed to help you stay well, provide peace of mind and help you prepare for the future. We offer a choice of medical, dental and vision plans in all locations enabling team members to select the plans that best meet their family healthcare needs and budget. Micron also provides benefit programs that help protect your income if you are unable to work due to illness or injury, and paid family leave. Additionally, Micron benefits include a robust paid time-off program and paid holidays. For additional information regarding the Benefit programs available, please see the Benefits Guide posted on ~~~/careers/benefits .

Micron is proud to be an equal opportunity workplace and is an affirmative action employer. All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, age, national origin, citizenship status, disability, protected veteran status, gender identity or any other factor protected by applicable federal, state, or local laws.

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